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Nanotechnology & Semiconductor Software Process Simulation Sofware
Process Simulation - SILVACO - US
3D SIMULATION
VICTORY PROCESS
FULL PHYSICAL 3D PROCESS SIMULATOR
VICTORY PROCESS is an open architecture process simulator. VICTORY PROCESS includes a complete set of advanced models for etch, deposition, implantation, diffusion and oxidation. Company proprietary models and public domain research models can be easily integrated into VICTORY PROCESS through its open architecture making it suitable for both commercial and academic applications. VICTORY PROCESS replaces costly wafer experiments with simulations to deliver shorter process development cycles. <Visit to Silvaco>
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2D SIMULATION
ATHENA
Process Simulation Framework
ATHENA framework integrates several process simulation modules within a user-friendly environment provided by Silvaco TCAD interactive tools. ATHENA has evolved from a world-renowned Stanford University simulator SUPREM-IV, with many new capabilities developed in collaboration with dozens of academic and industrial partners. ATHENA provides a convenient platform for simulating processes used in semiconductor industry: ion implantation, diffusion, oxidation, physical etching and deposition, lithography, stress formation and silicidation.<Visit to Silvaco>
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1D SIMULATION
ATHENA 1D
1D Process Simulator
ATHENA 1D is a 1D mode of operation of the industry standard ATHENA 2D Process Simulator. ATHENA 1D forms a comprehensive general purpose one-dimensional (1D) process simulator used in the prediction of doping profiles and thicknesses produced by semiconductor processing. It uses the same physical models as ATHENA, SILVACO 2D process simulator widely used in semiconductor industry for design and optimization of various fabrication technologies. ATHENA 1D is thus very accurate and extremely fast. ATHENA 1D is able to simulate a complete process flow in a matter of minutes. <Visit to Silvaco>

SSuprem3 is a comprehensive general purpose one-dimensional (1D) process simulator used in the prediction of doping profiles and layer thicknesses produced by semiconductor processing. SSuprem3 is accurate, extremely fast and user friendly. It is able to simulate a complete flow of process steps in a matter of minutes. SSuprem3 can run interactively under DeckBuild for editing process simulation input files and under TonyPlot for graphics and post-processing. SSuprem3 provides interfaces to device simulators that enable simulated profiles to be input for device level simulation. SSuprem3 uses a built-in electrical solver to extract threshold voltages.
 


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